Swordfish Crack+ Activation Code Free Download (Final 2022) This is the latest version of the translation app Swordfish Activation Code 3.4.1. Field of the Invention The present invention relates generally to a method of forming a thin film and a thin film formed thereby and, more particularly, to a method of forming a thin film by means of a magnetron sputtering method and a thin film formed thereby. 2. Description of the Prior Art In the past, a vacuum arc evaporator method, a vacuum RF sputtering method, an ion plating method, an ion beam deposition method, a sputter deposition method, a chemical vapor deposition method, a plasma deposition method, a thermal evaporator method, a hot wire evaporation method, and the like have been used for forming a thin film of a tungsten (W) thin film on a substrate of a silicon (Si) wafer, a tantalum (Ta) wafer, or a stainless steel (SUS) wafer by using a metal of a group of metals including tungsten (W). It is necessary that the thin film is formed uniformly on the substrate. When a thin film is formed on the substrate, the uniformity of a thin film depends on the substrate in general. However, the structure of the substrate is complicated. Accordingly, it is difficult to evaluate the uniformity of the thin film by using the only evaluation of the structure of the substrate. Thus, in order to evaluate the uniformity of the thin film, it is necessary to evaluate the uniformity of the thin film while the uniformity of the thin film is confirmed by a method different from the substrate structure. As one of the methods, a method of evaluating the uniformity of the thin film in a structure of the thin film itself has been known. An example of the evaluation method is disclosed in Japanese Patent Laying-Open No. 4-290264. The thin film is divided into a plurality of portions, a difference between a position at which an intensity value is maximum and a position at which an intensity value is minimum in each portion is detected by a detection means, and a difference between maximum and minimum values of the difference for the plurality of portions is determined as a total of a relative uniformity value. As another method, a method of evaluating the uniformity of the thin film in a structure of an integrated circuit formed on a semiconductor substrate has been known. The integrated circuit is formed in a lot of regions in the semiconductor substrate. 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